Surface modification of doped ZnO thin films

Effects of photo-assisted electrodeless and ion RF-sputter etching on the structural and optical properties of sputtered ZnO:Al thin films were investigated. Photo-assisted electrodeless etching was appropriate for getting “smooth” surfaces and ion RF-sputter etching by high power has significantly...

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Bibliographic Details
Published in:Applied surface science 2010-07, Vol.256 (18), p.5606-5609
Main Authors: Flickyngerova, S., Skriniarova, J., Netrvalova, M., Kovac, J., Novotny, I., Sutta, P., Tvarozek, V.
Format: Article
Language:English
Subjects:
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Diffusion
Etching
Exact sciences and technology
Ii-vi semiconductors
Materials science
Optical properties
Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation
Optical properties of specific thin films
Physics
Sputtering
Structure and morphology
thickness
Surface cleaning, etching, patterning
Surface roughness
Surface treatments
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
Thin films
Thin-film solar cell
Transmittance
Zinc oxide
ZnO:Al
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Summary:Effects of photo-assisted electrodeless and ion RF-sputter etching on the structural and optical properties of sputtered ZnO:Al thin films were investigated. Photo-assisted electrodeless etching was appropriate for getting “smooth” surfaces and ion RF-sputter etching by high power has significantly modified the surface roughness with an increase of the light diffuse transmittance.
ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2010.03.033