Difference in the dynamic scaling behavior of droplet size distribution for coalescence under pulsed and continuous vapor delivery

Dynamic scaling behavior of the droplet size distribution in the coalescence regime for growth by pulsed laser deposition is studied experimentally and by computer simulation, and the same is compared with that for continuous vapor deposition. The scaling exponent for pulsed deposition is found to b...

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Bibliographic Details
Published in:Physical review letters 2001-02, Vol.86 (8), p.1570-1573
Main Authors: Narhe, R D, Khandkar, M D, Adhi, K P, Limaye, A V, Sainkar, S R, Ogale, S B
Format: Article
Language:English
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Summary:Dynamic scaling behavior of the droplet size distribution in the coalescence regime for growth by pulsed laser deposition is studied experimentally and by computer simulation, and the same is compared with that for continuous vapor deposition. The scaling exponent for pulsed deposition is found to be (1.2 +/- 0.1), which is significantly lower as compared to that for continuous deposition (1.6 +/- 0.1). Simulations reveal that this dramatic difference can be traced to the large fraction of multiple droplet coalescence under pulsed vapor delivery. A possible role of the differing diffusion fields in the two cases is also suggested.
ISSN:0031-9007
1079-7114
DOI:10.1103/PhysRevLett.86.1570