Atomic layer deposition of tin dioxide sensing film in microhotplate gas sensors

We report the use of atomic layer deposition (ALD) to produce the gas-sensitive tin dioxide film in a microhotplate gas sensor. The performance of the device was demonstrated using ethanol, acetone and acrylonitrile as model analytes. Fast response times and low drift rates of the output signal were...

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Bibliographic Details
Published in:Sensors and actuators. B, Chemical Chemical, 2010-06, Vol.148 (1), p.227-232
Main Authors: Niskanen, Antti J., Varpula, Aapo, Utriainen, Mikko, Natarajan, Gomathi, Cameron, David C., Novikov, Sergey, Airaksinen, Veli-Matti, Sinkkonen, Juha, Franssila, Sami
Format: Article
Language:English
Subjects:
Atomic layer deposition
Deposition
Devices
Ethanol
Ethyl alcohol
Gas sensors
Metal-oxide gas sensor
Metallizing
Microhotplate gas sensor
Tin dioxide
Tin oxides
Tungsten
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Summary:We report the use of atomic layer deposition (ALD) to produce the gas-sensitive tin dioxide film in a microhotplate gas sensor. The performance of the device was demonstrated using ethanol, acetone and acrylonitrile as model analytes. Fast response times and low drift rates of the output signal were measured, indicating a structurally stable tin dioxide film and reflecting the capabilities of ALD in gas sensor applications. Fabrication of the microhotplate using tungsten metallization and plasma deposited silicon dioxide dielectrics is also detailed.
ISSN:0925-4005
1873-3077
DOI:10.1016/j.snb.2010.05.018