Macromol. Rapid Commun. 7/2010

Back Cover: The schematic image presents an oligomer that contains an active dipole group and can be aligned by a low‐energy electron beam. This novel finding offers a facile method to control molecular ordering and allows versatile patterning of ordered and disordered regions as imprinted by a mask...

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Bibliographic Details
Published in:Macromolecular rapid communications. 2010-04, Vol.31 (7), p.n/a
Main Authors: Lau, Yiu-Ting Richard, Weng, Lu-Tao, Ng, Kai-Mo, Kempf, Manuel, Altstädt, Volker, Schultz, Jerold M., Chan, Chi-Ming
Format: Article
Language:English
Subjects:
Active control
Alignment
Dipoles
Electron beams
Masks
Oligomers
Patterning
Online Access:Get full text
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Summary:Back Cover: The schematic image presents an oligomer that contains an active dipole group and can be aligned by a low‐energy electron beam. This novel finding offers a facile method to control molecular ordering and allows versatile patterning of ordered and disordered regions as imprinted by a mask. Further details can be found in the article by Y. T. R. Lau, L. T. Weng, K. M. Ng, M. Kempf, V. Altstädt, J. M. Schultz, C.‐M. Chan* on page 634.
ISSN:1022-1336
1521-3927
DOI:10.1002/marc.201090018