Formation of barrier-type anodic films on sputtering-deposited Al–Ti alloys

► Amorphous anodic oxides form on Al-Ti alloys - compositions similar to alloys. ► Oxides growth by migration of Al 3+, Ti 4+ and O 2- ions. ► Faster migration of Ti 4+ ions than Al 3+ ions results in Ti 4+-rich surface layer. The formation of amorphous anodic films at constant current is investigat...

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Bibliographic Details
Published in:Corrosion science 2010-11, Vol.52 (11), p.3717-3724
Main Authors: Nettikaden, V.C., Baron-Wiecheć, A., Bailey, P., Noakes, T.C.Q., Skeldon, P., Thompson, G.E.
Format: Article
Language:English
Subjects:
A. Titanium
A: Aluminium
Alloys
Aluminum base alloys
Aluminum oxide
Anodic
Applied sciences
B. RBS
B: TEM
C: Anodic films
Corrosion
Corrosion environments
Electrolytes
Exact sciences and technology
Metals. Metallurgy
Migration
Oxides
Production techniques
Surface treatment
Titanium
Titanium dioxide
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Summary:► Amorphous anodic oxides form on Al-Ti alloys - compositions similar to alloys. ► Oxides growth by migration of Al 3+, Ti 4+ and O 2- ions. ► Faster migration of Ti 4+ ions than Al 3+ ions results in Ti 4+-rich surface layer. The formation of amorphous anodic films at constant current is investigated for sputtering-deposited Al–Ti alloys containing from 3–30 at.% Ti. The films were grown at high efficiency in a borate electrolyte and comprised a main region containing units of Al 2O 3 and TiO 2, with a thin surface region enriched in titanium species. The formation ratios of the films increased with increase of titanium content of the alloys. The presence of the outer region is explained by the faster migration of Ti 4+ ions relative to that of Al 3+ ions through the films.
ISSN:0010-938X
1879-0496
DOI:10.1016/j.corsci.2010.07.022