A study of ion suppression effects in electrospray ionization from mobile phase additives and solid-phase extracts

Since the wide adoption of liquid chromatography/tandem mass spectrometry (LC/MS/MS), the ion suppression/enhancement phenomenon is the latest barrier to high‐throughput analysis. This consequence of a nonoptimized analytical method can lead to adverse effects during quantitation (i.e. poor accuracy...

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Bibliographic Details
Published in:Rapid communications in mass spectrometry 2004-01, Vol.18 (1), p.49-58
Main Authors: Mallet, Claude R., Lu, Ziling, Mazzeo, Jeff R.
Format: Article
Language:English
Subjects:
Chromatography, Liquid
Humans
Indicators and Reagents - chemistry
Ions
Mass Spectrometry - methods
Phase Transition
Plasma - chemistry
Solutions - chemistry
Spectrometry, Mass, Electrospray Ionization - methods
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Summary:Since the wide adoption of liquid chromatography/tandem mass spectrometry (LC/MS/MS), the ion suppression/enhancement phenomenon is the latest barrier to high‐throughput analysis. This consequence of a nonoptimized analytical method can lead to adverse effects during quantitation (i.e. poor accuracy and precision). Previous papers have reported that ion suppression is a direct result of endogenous material present in biological samples. However, in the case of a solid‐phase liquid chromatography/tandem mass spectrometry (SPE/LC/MS/MS) system, the measured result is the combination of several operating conditions and parameters. Little has been done to effectively monitor and/or choose optimized conditions for the complete sequence of extraction, clean up, separation and analysis. This paper describes a simple setup for quantification of ion suppression/enhancement. Several mobile phase additives, ion‐pairing agents and SPE extracts were measured and compared against a standard reference. The results demonstrated that a clean up of plasma extracts based on ion exchange leads to minimal ion suppression/enhancement for the compounds that were investigated. Copyright © 2003 John Wiley & Sons, Ltd.
ISSN:0951-4198
1097-0231
DOI:10.1002/rcm.1276