Excimer laser use for microetching computer-generated holographic structures

Excimer-laser microetching of a variety of materials is applied to the fabrication of surface-relief optical microstructures of arbitrary morphology, with particular emphasis on computer-generated holographic structures. High-definition, high-radiation-intensity selective laser ablative etching in c...

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Bibliographic Details
Published in:Applied optics (2004) 1996-11, Vol.35 (32), p.6304-6319
Main Authors: Vainos, N A, Mailis, S, Pissadakis, S, Boutsikaris, L, Parmiter, P J, Dainty, P, Hall, T J
Format: Article
Language:English
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Summary:Excimer-laser microetching of a variety of materials is applied to the fabrication of surface-relief optical microstructures of arbitrary morphology, with particular emphasis on computer-generated holographic structures. High-definition, high-radiation-intensity selective laser ablative etching in conjunction with step-and-repeat (period) replication or raster (pixel) scanning is used. To support such developments, the characteristic etching properties of a wide range of solid materials, from metals to semiconductors and polymers, are studied. Optical-interconnect and generic object holograms are produced by means of this alternative one-step holographic information-recording method.
ISSN:1559-128X
DOI:10.1364/AO.35.006304