Non-Reflecting Silicon and Polymer Surfaces by Plasma Etching and Replication

Maskless plasma etching forms nanospikes on a silicon wafer. The inverse of the nanospike pattern is replicated into a poly(dimethylsiloxane) (PDMS) film by casting. The PDMS functions as a stamp for replicating the original pattern into polymeric substrates. All nanospike‐structured surfaces suppre...

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Bibliographic Details
Published in:Advanced materials (Weinheim) 2011-01, Vol.23 (1), p.122-126
Main Authors: Sainiemi, Lauri, Jokinen, Ville, Shah, Ali, Shpak, Maksim, Aura, Susanna, Suvanto, Pia, Franssila, Sami
Format: Article
Language:English
Subjects:
Dimethylpolysiloxanes - chemistry
Light
nanofabrication
Nanostructures - chemistry
Nanostructures - ultrastructure
Nanotechnology - methods
Plasma etching
reflection suppression
Replication
self-cleaning surfaces
Silicon
Silicon - chemistry
Surface Properties
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Summary:Maskless plasma etching forms nanospikes on a silicon wafer. The inverse of the nanospike pattern is replicated into a poly(dimethylsiloxane) (PDMS) film by casting. The PDMS functions as a stamp for replicating the original pattern into polymeric substrates. All nanospike‐structured surfaces suppress light reflection and can be made self‐cleaning.
ISSN:0935-9648
1521-4095
1521-4095
DOI:10.1002/adma.201001810