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Nematic liquid crystal alignment on the ion beam-exposed ZnO film
This paper investigates the nematic liquid crystal (NLC) alignment on ion beam-exposed zinc oxide (ZnO) films. The ZnO films are deposited by a radio frequency magnetron sputtering. During the deposition of ZnO film, we supplied sufficient oxygen gas for high resistivity and transmittance. The depos...
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Published in: | Thin solid films 2010-11, Vol.519 (2), p.885-889 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | This paper investigates the nematic liquid crystal (NLC) alignment on ion beam-exposed zinc oxide (ZnO) films. The ZnO films are deposited by a radio frequency magnetron sputtering. During the deposition of ZnO film, we supplied sufficient oxygen gas for high resistivity and transmittance. The deposited films show a high transmittance of over 90% and high resistivity of over 10
10
Ω
cm. The ZnO films show a high deposition rate of 26.7
Å/min. Images obtained via scanning electron microscopy of the ZnO film surfaces, before and after the ion beam exposure, show that groove patterns are formed being to be parallel to the ion beam exposure direction. LC cells are fabricated with the ion beam-exposed ZnO films. The NLC molecules align parallel to the ion beam exposure direction. The electro-optic and response characteristics of fabricated cells show the possibility of application to liquid crystal displays. |
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ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/j.tsf.2010.08.105 |