Large-area, uniform, high-spatial-frequency ripples generated on silicon using a nanojoule-femtosecond laser at high repetition rate

Large-area high-spatial-frequency patterns (HSFLs) of λ/6 periodicity have been generated by a nanojoule-femtosecond laser scanning technique (80 MHz, 170 fs, 700-950 nm) at the silicon-air interface. The excellent large-area uniformity allowed reproducible and accurate measurements of the periodici...

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Bibliographic Details
Published in:Optics letters 2011-01, Vol.36 (2), p.229-231
Main Authors: LE HARZIC, R, DÖRR, D, SAUER, D, NEUMEIER, M, EPPLE, M, ZIMMERMANN, H, STRACKE, F
Format: Article
Language:English
Subjects:
Air
Exact sciences and technology
Feasibility Studies
Fundamental areas of phenomenology (including applications)
Lasers
Optics
Physics
Silicon
Surface Properties
Time Factors
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Summary:Large-area high-spatial-frequency patterns (HSFLs) of λ/6 periodicity have been generated by a nanojoule-femtosecond laser scanning technique (80 MHz, 170 fs, 700-950 nm) at the silicon-air interface. The excellent large-area uniformity allowed reproducible and accurate measurements of the periodicity. Variation of experimental parameters as illumination geometry, and pulse energy and number showed no influence on the ripple spacing. A wavelength dependence was observed and compared to current models of HSFL formation. A particular second-harmonic model was found to match the results best but needs to take into account transient changes in the refractive index under laser exposure. A second-harmonic mechanism is further supported by direct spectroscopic observation.
ISSN:0146-9592
1539-4794
DOI:10.1364/ol.36.000229