Growth and characterization of nitrogen-doped TiO2 thin films prepared by reactive pulsed laser deposition

Nitrogen-doped titanium dioxide (TiO2) thin films were grown on (001) SiO2 substrates by reactive pulsed laser deposition. A KrF* excimer laser source (I' =248nm, Ie" FWHM a[control]?10ns, I[frac12] =10Hz) was used for the irradiations of pressed powder targets composed by both anatase and...

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Bibliographic Details
Published in:Thin solid films 2010-12, Vol.519 (4), p.1464-1469
Main Authors: SAUTHIER, G, FERRER, F. J, FIGUERAS, A, GYÖRGY, E
Format: Article
Language:English
Subjects:
Bonding
Concentration (composition)
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Crystal structure
Exact sciences and technology
Laser deposition
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physical radiation effects, radiation damage
Physics
Pulsed laser deposition
Rutile
Structure and morphology
thickness
Structure of solids and liquids
crystallography
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Theory and models of film growth
Thin film structure and morphology
Thin films
Titanium dioxide
X-rays
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Summary:Nitrogen-doped titanium dioxide (TiO2) thin films were grown on (001) SiO2 substrates by reactive pulsed laser deposition. A KrF* excimer laser source (I' =248nm, Ie" FWHM a[control]?10ns, I[frac12] =10Hz) was used for the irradiations of pressed powder targets composed by both anatase and rutile phase TiO2. The experiments were performed in a controlled reactive atmosphere consisting of oxygen or mixtures of oxygen and nitrogen gases. The obtained thin film crystal structure was investigated by X-ray diffraction, while their chemical composition as well as chemical bonding states between the elements were studied by X-ray photoelectron spectroscopy. An interrelation was found between nitrogen concentration, crystalline structure, bonding states between the elements, and the formation of titanium oxinitride compounds. Moreover, as a result of the nitrogen incorporation in the films a continuous red-shift of the optical absorption edge accompanied by absorption in the visible spectral range between 400 and 500nm wavelength was observed.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2010.09.043