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Growth and characterization of nitrogen-doped TiO2 thin films prepared by reactive pulsed laser deposition
Nitrogen-doped titanium dioxide (TiO2) thin films were grown on (001) SiO2 substrates by reactive pulsed laser deposition. A KrF* excimer laser source (I' =248nm, Ie" FWHM a[control]?10ns, I[frac12] =10Hz) was used for the irradiations of pressed powder targets composed by both anatase and...
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Published in: | Thin solid films 2010-12, Vol.519 (4), p.1464-1469 |
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description | Nitrogen-doped titanium dioxide (TiO2) thin films were grown on (001) SiO2 substrates by reactive pulsed laser deposition. A KrF* excimer laser source (I' =248nm, Ie" FWHM a[control]?10ns, I[frac12] =10Hz) was used for the irradiations of pressed powder targets composed by both anatase and rutile phase TiO2. The experiments were performed in a controlled reactive atmosphere consisting of oxygen or mixtures of oxygen and nitrogen gases. The obtained thin film crystal structure was investigated by X-ray diffraction, while their chemical composition as well as chemical bonding states between the elements were studied by X-ray photoelectron spectroscopy. An interrelation was found between nitrogen concentration, crystalline structure, bonding states between the elements, and the formation of titanium oxinitride compounds. Moreover, as a result of the nitrogen incorporation in the films a continuous red-shift of the optical absorption edge accompanied by absorption in the visible spectral range between 400 and 500nm wavelength was observed. |
doi_str_mv | 10.1016/j.tsf.2010.09.043 |
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An interrelation was found between nitrogen concentration, crystalline structure, bonding states between the elements, and the formation of titanium oxinitride compounds. 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J</au><au>FIGUERAS, A</au><au>GYÖRGY, E</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Growth and characterization of nitrogen-doped TiO2 thin films prepared by reactive pulsed laser deposition</atitle><jtitle>Thin solid films</jtitle><date>2010-12-01</date><risdate>2010</risdate><volume>519</volume><issue>4</issue><spage>1464</spage><epage>1469</epage><pages>1464-1469</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><abstract>Nitrogen-doped titanium dioxide (TiO2) thin films were grown on (001) SiO2 substrates by reactive pulsed laser deposition. A KrF* excimer laser source (I' =248nm, Ie" FWHM a[control]?10ns, I[frac12] =10Hz) was used for the irradiations of pressed powder targets composed by both anatase and rutile phase TiO2. The experiments were performed in a controlled reactive atmosphere consisting of oxygen or mixtures of oxygen and nitrogen gases. The obtained thin film crystal structure was investigated by X-ray diffraction, while their chemical composition as well as chemical bonding states between the elements were studied by X-ray photoelectron spectroscopy. An interrelation was found between nitrogen concentration, crystalline structure, bonding states between the elements, and the formation of titanium oxinitride compounds. Moreover, as a result of the nitrogen incorporation in the films a continuous red-shift of the optical absorption edge accompanied by absorption in the visible spectral range between 400 and 500nm wavelength was observed.</abstract><cop>Amsterdam</cop><pub>Elsevier</pub><doi>10.1016/j.tsf.2010.09.043</doi><tpages>6</tpages></addata></record> |
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subjects | Bonding Concentration (composition) Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Crystal structure Exact sciences and technology Laser deposition Materials science Methods of deposition of films and coatings film growth and epitaxy Physical radiation effects, radiation damage Physics Pulsed laser deposition Rutile Structure and morphology thickness Structure of solids and liquids crystallography Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Theory and models of film growth Thin film structure and morphology Thin films Titanium dioxide X-rays |
title | Growth and characterization of nitrogen-doped TiO2 thin films prepared by reactive pulsed laser deposition |
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