Optical and structural properties of pulsed laser ablation deposited ZnO thin film

• Published in: Applied surface science 2011, Vol.257 (6), p.2298-2302
• Main Authors: Fazio, E., Mezzasalma, A.M., Mondio, G., Serafino, T., Barreca, F., Caridi, F.
• Format: Article
• Language: English
• Subjects: Condensed matter: electronic structure, electrical, magnetic, and optical properties; Condensed matter: structure, mechanical and thermal properties; Deposition; Diffraction; Electron and ion emission by liquids and solids; impact phenomena; Electron energy loss spectroscopy; Exact sciences and technology; Impact phenomena (including electron spectra and sputtering); Laser ablation; Laser-beam impact phenomena; Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity); Optical constants: refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity; Optical properties; Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation; Optical properties of bulk materials and thin films; Physics; Pulsed laser ablation; Pulsed lasers; Reflection; Reflection electron energy loss spectroscopy; Structure and morphology; thickness; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thin film structure and morphology; Thin films; X-rays; Zinc oxide
• ISSN: 0169-4332; 1873-5584
• DOI: 10.1016/j.apsusc.2010.09.092

A limited number of reports exists in the literature concerning the systematic study of the structural and optical properties of ZnO thin films, produced by pulsed laser ablation, in correlation with the deposition parameters adopted. In this paper we present a characterization of a sample prepared by this technique and studied by photoelectron spectroscopy and X-ray diffraction. The dielectric function of both target and films has been deduced by reflection electron energy loss spectroscopy.