High Refractive Index Fluid for Next Generation ArF Immersion Lithography

ArF immersion lithography using a high-refractive-index fluid (HIF) is considered to be one of the most promising candidates for hp38nm or below. We have developed JSR HIL-001 and HIL-002 as new immersion fluids, the refractive index and transmittance of which are 1.64, >98%/mm and 1.65, >99%/...

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Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 2006, Vol.19(5), pp.641-646
Main Authors: Furukawa, Taiichi, Hieda, Katsuhiko, Wang, Yong, Miyamatsu, Takashi, Yamada, Kinji, Tominaga, Tetsuo, Makita, Yutaka, Nakagawa, Hiroki, Nakamura, Atshushi, Shima, Motoyuki, Shimokawa, Tsutomu
Format: Article
Language:English
Subjects:
ArF immersion lithography
Fluid dynamics
Fluid flow
Fluids
high-refractive-index fluid
Immersion
Lithography
photo-decomposition
Photochemical
photoresist defects
Refractive index
Refractivity
UV absorption
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Summary:ArF immersion lithography using a high-refractive-index fluid (HIF) is considered to be one of the most promising candidates for hp38nm or below. We have developed JSR HIL-001 and HIL-002 as new immersion fluids, the refractive index and transmittance of which are 1.64, >98%/mm and 1.65, >99%/mm (193.4nm, 23&deg:C), respectively. Using HIL-001 immersion and a two-beam interferometric exposure tool, hp30nm imaging has been demonstrated. However, despite the remarkable advances of recent HIF research, there is still a lot of issue about whether an organic fluid can be used in immersion lithography, since optical and photochemical behaviors of organic fluids at ArF wavelength have not been well understood so far. Besides, cost and disposal issues will be encountered when the organic immersion fluid is substituted for water. In this paper, we will address such problems by reporting our updated results on research of JSR HILs.
ISSN:0914-9244
1349-6336
1349-6336
DOI:10.2494/photopolymer.19.641