Fabrication of Magnetic Nanodots Array Using UV Nanoimprint Lithography and Electrodeposition for High Density Patterned Media

A Magnetic nanodots array fabrication method using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition was developed. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, simple and high throughput fabrication process was realized. The CoPt na...

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Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 2008/06/24, Vol.21(4), pp.591-596
Main Authors: Shinohara, Hidetoshi, Fukuhara, Makoto, Hirasawa, Tamano, Mizuno, Jun, Shoji, Shuichi
Format: Article
Language:English
Subjects:
Arrays
chemical mechanical polishing
Electrodeposition
Lithography
magnetic nanodots array
Nanocomposites
Nanomaterials
Nanostructure
Roughness
Ultraviolet
UV nanoimprint lithography
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Summary:A Magnetic nanodots array fabrication method using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition was developed. Since the photocurable resin patterned by UV-NIL was directly used for electrodeposition mask, simple and high throughput fabrication process was realized. The CoPt nanodots (diameter: 120 nm) array was formed after the electrodeposition. After chemical mechanical polishing (CMP), the arithmetic mean roughness (Ra) of the track area was smaller than 1 nm.
ISSN:0914-9244
1349-6336
1349-6336
DOI:10.2494/photopolymer.21.591