Simulation Study on Bubble Trapping in UV Nanoimprint Lithography

Bubble trapping in the template pattern during the resist filling process is one of the most serious issues in UV-nanoimprint lithography. The mechanism of bubble trapping is studied based on a numerical analysis of the resist flow in a simple model. Flow behavior of water-like low viscosity liquid...

Full description

Saved in:
Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 2009/06/30, Vol.22(2), pp.171-174
Main Authors: Nagaoka, Yoshinori, Morihara, Daisuke, Hiroshima, Hiroshi, Hirai, Yoshihiko
Format: Article
Language:English
Subjects:
bubble trap
Bubbles
Computer simulation
Contact angle
Liquids
Lithography
Nanostructure
polymer
resist
Resists
surface tension
template
Trapping
UV nanoimprint
viscos flow
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Bubble trapping in the template pattern during the resist filling process is one of the most serious issues in UV-nanoimprint lithography. The mechanism of bubble trapping is studied based on a numerical analysis of the resist flow in a simple model. Flow behavior of water-like low viscosity liquid as a resist is investigated for particular structures of the template and various contact angles for the template and the substrate. Time evolutions of the flow of the resist are simulated and the mechanism of bubble trapping is demonstrated. The results show that large contact angle between the resist and the template causes bubble trapping, also small contact angle between the resist and the substrate causes bubble.
ISSN:0914-9244
1349-6336
1349-6336
DOI:10.2494/photopolymer.22.171