Impact of De-molding Force on Exposure Dosage in UV-Nanoimprint Process

Mold releasing forces are experimentally measured in various exposure dosages for UV nanoimprint resist. PAK01 resist is examined to evaluate the chemical conversion by FTIR. Time dependent conversion ratio is measured under UV exposure and the conversion ratio of the UV resin versus exposed dosages...

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Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 2009/06/30, Vol.22(2), pp.181-184
Main Authors: Fujii, Noriyoshi, Tanabe, Toshiaki, Hirasawa, Tamano, Kawata, Hiroaki, Sakai, Nobuji, Hirai, Yoshihiko
Format: Article
Language:English
Subjects:
Conversion
Conversion ratio
Dosage
durability
Molds
Nanocomposites
Nanoimprint
Nanostructure
photo-curable resin
release agent
Releasing
Resists
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Summary:Mold releasing forces are experimentally measured in various exposure dosages for UV nanoimprint resist. PAK01 resist is examined to evaluate the chemical conversion by FTIR. Time dependent conversion ratio is measured under UV exposure and the conversion ratio of the UV resin versus exposed dosages is verified. Also, releasing forces for various exposure dosages are mechanically measured for flat mold. The results show the measured releasing force is not stabilized until the conversion is completed up to over around 90 %. Based on these results, the minimums exposure dosage is known for successful releasing.
ISSN:0914-9244
1349-6336
1349-6336
DOI:10.2494/photopolymer.22.181