Approaches for 193 nm and 248 nm First and Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC)

We review approaches that we have developed at 193 and 248 nm for first and second generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC) and give an account of our most recent results for both types of DBARC's.

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Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 2008/06/24, Vol.21(3), pp.383-392
Main Authors: Houlihan, Francis, Miyazaki, Shinji, Dioses, Alberto, Zhang, Lin, Ubayashi, Yuki, Ohta, Kazuyoshi, Oberlander, Joseph, Krawicz, Alexandra, Vasanthan, Sumathy, Li, Meng, Wei, Yayi, Lu, PingHung, Neisser, Mark
Format: Article
Language:English
Subjects:
193 nm
248 nm
ArF
Coatings
DBARC
Developable bottom antireflective coating
KrF
Photopolymers
Online Access:Get full text
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Description
Summary:We review approaches that we have developed at 193 and 248 nm for first and second generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC) and give an account of our most recent results for both types of DBARC's.
ISSN:0914-9244
1349-6336
1349-6336
DOI:10.2494/photopolymer.21.383