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Approaches for 193 nm and 248 nm First and Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC)
We review approaches that we have developed at 193 and 248 nm for first and second generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC) and give an account of our most recent results for both types of DBARC's.
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| Published in: | Journal of Photopolymer Science and Technology 2008/06/24, Vol.21(3), pp.383-392 |
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| Main Authors: | , , , , , , , , , , , , |
| Format: | Article |
| Language: | English |
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| Online Access: | Get full text |
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| container_end_page | 392 |
| container_issue | 3 |
| container_start_page | 383 |
| container_title | Journal of Photopolymer Science and Technology |
| container_volume | 21 |
| creator | Houlihan, Francis Miyazaki, Shinji Dioses, Alberto Zhang, Lin Ubayashi, Yuki Ohta, Kazuyoshi Oberlander, Joseph Krawicz, Alexandra Vasanthan, Sumathy Li, Meng Wei, Yayi Lu, PingHung Neisser, Mark |
| description | We review approaches that we have developed at 193 and 248 nm for first and second generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC) and give an account of our most recent results for both types of DBARC's. |
| doi_str_mv | 10.2494/photopolymer.21.383 |
| format | article |
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| fulltext | fulltext |
| identifier | ISSN: 0914-9244 |
| ispartof | Journal of Photopolymer Science and Technology, 2008/06/24, Vol.21(3), pp.383-392 |
| issn | 0914-9244 1349-6336 1349-6336 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_864400556 |
| source | Free Full-Text Journals in Chemistry |
| subjects | 193 nm 248 nm ArF Coatings DBARC Developable bottom antireflective coating KrF Photopolymers |
| title | Approaches for 193 nm and 248 nm First and Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC) |
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