UV Nanoimprint Lithography and Its Application for Nanodevices

Nanostructure fabrication process using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition were proposed. This method shows remarkable advantages in high throughput production and fabrication cost. For this process, the newly resin which endures wet process was developed. Co dot arra...

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Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 2007, Vol.20(4), pp.549-554
Main Authors: Fukuhara, Makoto, Ono, Hiroshi, Hirasawa, Tamano, Otaguchi, Makoto, Sakai, Nobuji, Mizuno, Jun, Shoji, Shuichi
Format: Article
Language:English
Subjects:
Arrays
Electrodeposition
Gallium nitrides
LED
Lithography
magnetic dot array
Nanocomposites
Nanomaterials
Nanostructure
Polymers
UV-nanoimprint
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Summary:Nanostructure fabrication process using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition were proposed. This method shows remarkable advantages in high throughput production and fabrication cost. For this process, the newly resin which endures wet process was developed. Co dot arrays of 220nm were fabricated by electrodeposition after UV-NIL. GaN structure of 300nm was also realized using Ni as an etching mask fabricated by proposed process.
ISSN:0914-9244
1349-6336
1349-6336
DOI:10.2494/photopolymer.20.549