Issues and Requirements of Polymers for Thermal NIL

The requirements of polymers best suitable for thermal nanoimprint lithography are derived from the processing demands. Therefore characteristics of this type of mechanical process are discussed, and typical results obtained from rheological characterization of polymers are addressed. The main effor...

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Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 2007, Vol.20(4), pp.539-544
Main Authors: Scheer, H.-C., Wissen, M., Bogdanski, N., Möllenbeck, S.
Format: Article
Language:English
Subjects:
Density
Lithography
Molecular weight
Molecular weight distribution
Nanocomposites
Nanomaterials
Nanostructure
polymer viscosity
Polymers
T-NIL-UV hybrid process
thermal nanoimprint
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Summary:The requirements of polymers best suitable for thermal nanoimprint lithography are derived from the processing demands. Therefore characteristics of this type of mechanical process are discussed, and typical results obtained from rheological characterization of polymers are addressed. The main effort is laid on the impact of processing temperature and molecular weight of the polymer for the imprint result, namely residual layer uniformity and defect avoidance, when realistic stamps with different pattern sizes and pattern densities are imprinted. Under such conditions a polymer for T-NIL should feature a mean molecular weight of about 200-300 kg/mol as well as a medium broad molecular weight distribution. In addition a hybrid process is addressed, where T-NIL defines the nanometer pattern and UV-Lithography the micron sized patterns. For such a purpose polymers with UV-crosslink without need for a post exposure bake are beneficial to enable the use of conventional photomasks.
ISSN:0914-9244
1349-6336
1349-6336
DOI:10.2494/photopolymer.20.539