High Resolution Positive-Working Molecular Resist Derived from Truxene

A novel molecular resist based on a new amorphous molecule, a truxene derivative, was designed and synthesized. Truxene is characterized as an amorphous solid with a high glass transition temperature (Tg). H alf-pitch (hp) 50 nm line-and-space (1 : 1) positive pattern was fabricated by the exposure...

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Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 2009/06/30, Vol.22(5), pp.609-614
Main Authors: Hattori, Shigeki, Yamada, Arisa, Saito, Satoshi, Asakawa, Koji, Koshiba, Takeshi, Nakasugi, Tetsuro
Format: Article
Language:English
Subjects:
50 nm
Derivatives
Electron beams
Glass transition temperature
High resolution
LWR
molecular resist
Photopolymers
Resists
truxene derivative
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Summary:A novel molecular resist based on a new amorphous molecule, a truxene derivative, was designed and synthesized. Truxene is characterized as an amorphous solid with a high glass transition temperature (Tg). H alf-pitch (hp) 50 nm line-and-space (1 : 1) positive pattern was fabricated by the exposure of an electron beam (30 keV) using the novel molecular resist. Design of novel molecular resists based on the truxene derivative is promising for development of more efficient molecular resists.
ISSN:0914-9244
1349-6336
1349-6336
DOI:10.2494/photopolymer.22.609