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Photodegradation of melanin by an interferometric technique
Photodegradation of melanin thin films is investigated for a UVA wavelength of 355 nm and a UVC wavelength of 244 nm. The technique involves interferometric exposure of melanin with two coherent beams from a low-power UV laser. The periodic photodegradation-grating pattern is monitored by diffractio...
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Published in: | Optics letters 2011-05, Vol.36 (9), p.1734-1736 |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Photodegradation of melanin thin films is investigated for a UVA wavelength of 355 nm and a UVC wavelength of 244 nm. The technique involves interferometric exposure of melanin with two coherent beams from a low-power UV laser. The periodic photodegradation-grating pattern is monitored by diffraction of a second low-power He-Ne laser. Dependence of the photodegradation rate on UV intensity as well as the effect of ambient humidity is investigated and explained with a simple model. The technique has promise for investigating photo-induced effects in other biomolecular substrates as well. |
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ISSN: | 0146-9592 1539-4794 |
DOI: | 10.1364/OL.36.001734 |