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Photodegradation of melanin by an interferometric technique

Photodegradation of melanin thin films is investigated for a UVA wavelength of 355 nm and a UVC wavelength of 244 nm. The technique involves interferometric exposure of melanin with two coherent beams from a low-power UV laser. The periodic photodegradation-grating pattern is monitored by diffractio...

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Bibliographic Details
Published in:Optics letters 2011-05, Vol.36 (9), p.1734-1736
Main Authors: FARLEY, C. W, KASSU, A, SHARMA, A
Format: Article
Language:English
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Summary:Photodegradation of melanin thin films is investigated for a UVA wavelength of 355 nm and a UVC wavelength of 244 nm. The technique involves interferometric exposure of melanin with two coherent beams from a low-power UV laser. The periodic photodegradation-grating pattern is monitored by diffraction of a second low-power He-Ne laser. Dependence of the photodegradation rate on UV intensity as well as the effect of ambient humidity is investigated and explained with a simple model. The technique has promise for investigating photo-induced effects in other biomolecular substrates as well.
ISSN:0146-9592
1539-4794
DOI:10.1364/OL.36.001734