Evaluation of Curing Characteristics in UV-NIL Resist

Mechanical characteristics of UV curable resist for UV nanoimprint lithography are investigated using UV rheology meter. Modulations of visco-elatic properties and thickness shrinkages in typical resists are evaluated in variation of exposure UV intensity. The mechanical modulation speed of the resi...

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Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 2010/06/22, Vol.23(1), pp.51-54
Main Authors: Suzuki, Ryosuke, Sakai, Nobuji, Sekiguchi, Atsushi, Matsumoto, Yoko, Tanaka, Risa, Hirai, Yoshihiko
Format: Article
Language:English
Subjects:
Conversion
conversion time
Curing
Lithography
Measuring instruments
Modulation
modulus
Nanocomposites
Nanomaterials
Nanostructure
Resists
shrinkage
UV curable resist
UV nanoimprint
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Summary:Mechanical characteristics of UV curable resist for UV nanoimprint lithography are investigated using UV rheology meter. Modulations of visco-elatic properties and thickness shrinkages in typical resists are evaluated in variation of exposure UV intensity. The mechanical modulation speed of the resist depends on the UV intensity, which affects to throughput of UV nanoimprint lithography process. To handle the characteristics universally, effective conversion time is newly introduced, which fairly expresses the resist modifications.
ISSN:0914-9244
1349-6336
1349-6336
DOI:10.2494/photopolymer.23.51