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Evaluation of Curing Characteristics in UV-NIL Resist
Mechanical characteristics of UV curable resist for UV nanoimprint lithography are investigated using UV rheology meter. Modulations of visco-elatic properties and thickness shrinkages in typical resists are evaluated in variation of exposure UV intensity. The mechanical modulation speed of the resi...
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Published in: | Journal of Photopolymer Science and Technology 2010/06/22, Vol.23(1), pp.51-54 |
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container_end_page | 54 |
container_issue | 1 |
container_start_page | 51 |
container_title | Journal of Photopolymer Science and Technology |
container_volume | 23 |
creator | Suzuki, Ryosuke Sakai, Nobuji Sekiguchi, Atsushi Matsumoto, Yoko Tanaka, Risa Hirai, Yoshihiko |
description | Mechanical characteristics of UV curable resist for UV nanoimprint lithography are investigated using UV rheology meter. Modulations of visco-elatic properties and thickness shrinkages in typical resists are evaluated in variation of exposure UV intensity. The mechanical modulation speed of the resist depends on the UV intensity, which affects to throughput of UV nanoimprint lithography process. To handle the characteristics universally, effective conversion time is newly introduced, which fairly expresses the resist modifications. |
doi_str_mv | 10.2494/photopolymer.23.51 |
format | article |
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issn | 0914-9244 1349-6336 1349-6336 |
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source | Full-Text Journals in Chemistry (Open access) |
subjects | Conversion conversion time Curing Lithography Measuring instruments Modulation modulus Nanocomposites Nanomaterials Nanostructure Resists shrinkage UV curable resist UV nanoimprint |
title | Evaluation of Curing Characteristics in UV-NIL Resist |
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