Micropatterning of single-walled carbon nanotube forest

In this work, high-aligned single-walled carbon nanotube (SWCNT) forest have been grown using a high-density plasma chemical vapor deposition technique (at room temperature) and patterned into micro-structures by photolithographic techniques, that are commonly used for silicon integrated circuit fab...

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Bibliographic Details
Published in:Progress in organic coatings 2011-04, Vol.70 (4), p.326-329
Main Authors: Mousinho, A.P., Mansano, R.D.
Format: Article
Language:English
Subjects:
Carbon nanotubes
CVD processes
Electronics
Forests
Iron
Magnetron sputtering
Micropatterning
Nanostructure films
Optoelectronic devices
Photolithography
Precursors
Raman Spectroscopy
Single wall carbon nanotubes
Thin films
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Summary:In this work, high-aligned single-walled carbon nanotube (SWCNT) forest have been grown using a high-density plasma chemical vapor deposition technique (at room temperature) and patterned into micro-structures by photolithographic techniques, that are commonly used for silicon integrated circuit fabrication. The SWCNTs were obtained using pure methane plasma and iron as precursor material (seed). For the growth carbon SWCNT forest the process pressure was 15 mTorr, the RF power was 250 W and the total time of the deposition process was 3 h. The micropatterning processes of the SWCNT forest included conventional photolithography and magnetron sputtering for growing an iron layer (precursor material). In this situation, the iron layer is patterned and high-aligned SWCNTs are grown in the where iron is present, and DLC is formed in the regions where the iron precursor is not present. The results can be proven by Scanning Electronic Microscopy and Raman Spectroscopy. Thus, it is possible to fabricate SWCNT forest-based electronic and optoelectronic devices.
ISSN:0300-9440
1873-331X
DOI:10.1016/j.porgcoat.2010.11.014