Self-Organization Effects in Photopolymerizable Nanocomposite

The main problem of photolithography is to overcome the diffraction limit. A possibility of overcoming this limit by the application of self-writing effects is discussed. Some of these effects are studied in the present work: the self-focusing of light in a photopolymer with a positive change of the...

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Bibliographic Details
Published in:Molecular crystals and liquid crystals (Philadelphia, Pa. : 2003) Pa. : 2003), 2011-01, Vol.536 (1), p.1/[233]-9/[241]
Main Authors: Denisyuk, I. Yu, Vorzobova, N. D., Burunkova, J. E., Arefieva, N. N., Fokina, M. I.
Format: Article
Language:English
Subjects:
Crystals
Diffraction
Light-induced displacement
Lithography
nanocomposite
Nanocomposites
Nanomaterials
Nanoparticles
Nanostructure
Photolithography
photopolymerization
self-focusing
self-writing
subwavelength lithography
Transportation
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Summary:The main problem of photolithography is to overcome the diffraction limit. A possibility of overcoming this limit by the application of self-writing effects is discussed. Some of these effects are studied in the present work: the self-focusing of light in a photopolymer with a positive change of the refractive index, photo-induced transportation of nanoparticles, and the threshold of oxygen-based polymerization. The results of applications of these effects to the lithography process are shown.
ISSN:1542-1406
1563-5287
DOI:10.1080/15421406.2011.538359