Direct laser writing for active and passive high-Q polymer microdisks on silicon

We report the fabrication of high-Q polymeric microdisks on silicon via direct laser writing utilizing two-photon absorption induced polymerization. The quality factors of the passive cavities are above 10(6) in the 1300 nm wavelength region. The flexible three-dimensional (3D) lithography method al...

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Bibliographic Details
Published in:Optics express 2011-06, Vol.19 (12), p.11451-11456
Main Authors: Grossmann, Tobias, Schleede, Simone, Hauser, Mario, Beck, Torsten, Thiel, Michael, von Freymann, Georg, Mappes, Timo, Kalt, Heinz
Format: Article
Language:English
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Summary:We report the fabrication of high-Q polymeric microdisks on silicon via direct laser writing utilizing two-photon absorption induced polymerization. The quality factors of the passive cavities are above 10(6) in the 1300 nm wavelength region. The flexible three-dimensional (3D) lithography method allows for the fabrication of different cavity thicknesses on the same substrate, useful for rapid prototyping of active and passive optical microcavities. Microdisk lasers are realized by doping the resist with dye, resulting in laser emission at visible wavelengths.
ISSN:1094-4087
1094-4087
DOI:10.1364/OE.19.011451