Glancing angle deposition of crystalline zinc oxide nanorods

• Published in: Thin solid films 2011-03, Vol.519 (11), p.3530-3537
• Main Authors: LaForge, Joshua M., Taschuk, Michael T., Brett, Michael J.
• Format: Article
• Language: English
• Subjects: Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Crystal; Crystal structure; Crystallinity; Deposition; Exact sciences and technology; Kinetics; Materials science; Methods of nanofabrication; Morphology; Nanorod; Nanorods; Nanoscale materials and structures: fabrication and characterization; Nanostructure; Nanotubes; Optimization; Other topics in nanoscale materials and structures; Physics; Sputtering; Structure and morphology; thickness; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Texturing; Thin film; Thin film structure and morphology; Zinc oxide
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/j.tsf.2011.01.241

Zinc oxide nanorod films produced by glancing angle deposition were fabricated within the parameter space defined by the process variables pitch (nanorod growth per substrate rotation), deposition rate, and throw distance to investigate the effect these parameters have on morphology and crystallinity. Statistical analysis was used to identify important relationships. Final film morphology depends on both pitch and deposition rate, where two growth regimes distinguished by deposition rate are observed and interpreted as arising from competition between geometric shadowing and crystalline growth kinetics. Optimal growth conditions for nanostructured films of isolated zinc oxide nanorods occurred for pitch values of approximately 1nm to 10nm. Pole-figure measurements confirm that the films consist of oriented single-crystal nanorods. Films deposited at all pitch values between 0.001nm to 6.5μm are crystalline and textured, and greater texturing is achieved for conditions of decreased surface diffusion.