Sputtered platinum–iridium layers as electrode material for functional electrostimulation

In this study co-sputtered layers of platinum–iridium (PtIr) are investigated as stimulation electrode material. The effects of different sputter parameters on the morphology and the electrochemical behavior are examined. It is shown that films sputtered at the lowest incident energy possess the hig...

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Bibliographic Details
Published in:Thin solid films 2011-03, Vol.519 (11), p.3965-3970
Main Authors: Ganske, G., Slavcheva, E., van Ooyen, A., Mokwa, W., Schnakenberg, U.
Format: Article
Language:English
Subjects:
Charge
Chemistry
Co-sputtering
Cross-disciplinary physics: materials science
rheology
Deposition by sputtering
Electrochemical activation
Electrochemistry
Electrode materials
Electrodes: preparations and properties
Electrostimulation
Exact sciences and technology
General and physical chemistry
Material characterization
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Morphology
Physics
Platinum–iridium
Stimulation
Storage capacity
Thin films
Voltammetry
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Summary:In this study co-sputtered layers of platinum–iridium (PtIr) are investigated as stimulation electrode material. The effects of different sputter parameters on the morphology and the electrochemical behavior are examined. It is shown that films sputtered at the lowest incident energy possess the highest charge storage capacity (CSC). At a Pt:Ir atomic-ratio of 55:45 the obtained CSC of 22mC/cm2 is enhanced compared to the standard stimulation material platinum (16mC/cm2) but inferior to iridium which has a CSC of 35mC/cm2. Long term cyclic voltammetry measurements show that PtIr can be activated which increases the CSC to 29mC/cm2. Also a change in the film morphology is observed. Sputtered platinum–iridium films promise to combine high mechanical strength and increased charge storage capacity.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2011.01.344