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Amorphous Inclusions in Irradiated Silicon and Their Effects on Material and Device Properties
Clustered damage plays an important role in determining the electronic properties of silicon irradiated with particles having a relatively high rate of nonionizing energy loss. This damage has generally been treated as being heavily defected crystal, but substantial evidence points to amorphization....
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Published in: | IEEE transactions on nuclear science 2008-12, Vol.55 (6), p.2992-2999 |
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container_title | IEEE transactions on nuclear science |
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creator | Palko, J.W. Srour, J.R. |
description | Clustered damage plays an important role in determining the electronic properties of silicon irradiated with particles having a relatively high rate of nonionizing energy loss. This damage has generally been treated as being heavily defected crystal, but substantial evidence points to amorphization. The structure of radiation-produced amorphous regions in silicon is modeled here using atomistic techniques. Those regions consist of a phase distinct from the surrounding crystal, and models based on amorphous inclusions can explain the dominance of clusters in determining key electronic properties in irradiated bulk material and devices. |
doi_str_mv | 10.1109/TNS.2008.2006751 |
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fullrecord | <record><control><sourceid>proquest_ieee_</sourceid><recordid>TN_cdi_proquest_miscellaneous_875052817</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>4723762</ieee_id><sourcerecordid>2545018831</sourcerecordid><originalsourceid>FETCH-LOGICAL-c353t-eed81f886e58f909341a28cfd0889d1cbef43d0dce069a69a35c31af919ab68a3</originalsourceid><addsrcrecordid>eNp9kU1LAzEQhoMoWKt3wUvwoKetyWazmxxLrVrwC1qvhjQ7oSnb3ZrsCv57s7Z48CCECTPzzMA7L0LnlIwoJfJm8TwfpYSIPuQFpwdoQDkXCeWFOEQDQqhIZCblMToJYR3TjBM-QO_jTeO3q6YLeFabqguuqQN2NZ55r0unWyjx3FXONDXWdYkXK3AeT60F0wYci08R8U5XP91b-HQG8KtvtuBbB-EUHVldBTjb_0P0djddTB6Sx5f72WT8mBjGWZsAlIJaIXLgwkoiWUZ1KowtiRCypGYJNmMlKQ2QXOr4GDeMaiup1MtcaDZE17u9W998dBBatXHBQFXpGqI2JYqoNhW0iOTVvySLdxGS9ODlH3DddL6OKpSkacpznvYQ2UHGNyF4sGrr3Ub7L0WJ6n1R0RfV-6L2vsSRi92IA4BfPCtSVuQp-wY13Ikk</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>912256527</pqid></control><display><type>article</type><title>Amorphous Inclusions in Irradiated Silicon and Their Effects on Material and Device Properties</title><source>IEEE Electronic Library (IEL) Journals</source><creator>Palko, J.W. ; Srour, J.R.</creator><creatorcontrib>Palko, J.W. ; Srour, J.R.</creatorcontrib><description>Clustered damage plays an important role in determining the electronic properties of silicon irradiated with particles having a relatively high rate of nonionizing energy loss. This damage has generally been treated as being heavily defected crystal, but substantial evidence points to amorphization. The structure of radiation-produced amorphous regions in silicon is modeled here using atomistic techniques. Those regions consist of a phase distinct from the surrounding crystal, and models based on amorphous inclusions can explain the dominance of clusters in determining key electronic properties in irradiated bulk material and devices.</description><identifier>ISSN: 0018-9499</identifier><identifier>EISSN: 1558-1578</identifier><identifier>DOI: 10.1109/TNS.2008.2006751</identifier><identifier>CODEN: IETNAE</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Amorphous materials ; Atomic layer deposition ; Atomic measurements ; Crystalline materials ; Damage ; Defect clusters ; Devices ; displacement damage ; Dominance ; Electronic properties ; Energy loss ; Inclusions ; Irradiation ; molecular dynamics ; Production ; Protons ; Radiation effects ; Silicon ; Thermal degradation</subject><ispartof>IEEE transactions on nuclear science, 2008-12, Vol.55 (6), p.2992-2999</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2008</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c353t-eed81f886e58f909341a28cfd0889d1cbef43d0dce069a69a35c31af919ab68a3</citedby><cites>FETCH-LOGICAL-c353t-eed81f886e58f909341a28cfd0889d1cbef43d0dce069a69a35c31af919ab68a3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/4723762$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,27924,27925,54796</link.rule.ids></links><search><creatorcontrib>Palko, J.W.</creatorcontrib><creatorcontrib>Srour, J.R.</creatorcontrib><title>Amorphous Inclusions in Irradiated Silicon and Their Effects on Material and Device Properties</title><title>IEEE transactions on nuclear science</title><addtitle>TNS</addtitle><description>Clustered damage plays an important role in determining the electronic properties of silicon irradiated with particles having a relatively high rate of nonionizing energy loss. This damage has generally been treated as being heavily defected crystal, but substantial evidence points to amorphization. The structure of radiation-produced amorphous regions in silicon is modeled here using atomistic techniques. Those regions consist of a phase distinct from the surrounding crystal, and models based on amorphous inclusions can explain the dominance of clusters in determining key electronic properties in irradiated bulk material and devices.</description><subject>Amorphous materials</subject><subject>Atomic layer deposition</subject><subject>Atomic measurements</subject><subject>Crystalline materials</subject><subject>Damage</subject><subject>Defect clusters</subject><subject>Devices</subject><subject>displacement damage</subject><subject>Dominance</subject><subject>Electronic properties</subject><subject>Energy loss</subject><subject>Inclusions</subject><subject>Irradiation</subject><subject>molecular dynamics</subject><subject>Production</subject><subject>Protons</subject><subject>Radiation effects</subject><subject>Silicon</subject><subject>Thermal degradation</subject><issn>0018-9499</issn><issn>1558-1578</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2008</creationdate><recordtype>article</recordtype><recordid>eNp9kU1LAzEQhoMoWKt3wUvwoKetyWazmxxLrVrwC1qvhjQ7oSnb3ZrsCv57s7Z48CCECTPzzMA7L0LnlIwoJfJm8TwfpYSIPuQFpwdoQDkXCeWFOEQDQqhIZCblMToJYR3TjBM-QO_jTeO3q6YLeFabqguuqQN2NZ55r0unWyjx3FXONDXWdYkXK3AeT60F0wYci08R8U5XP91b-HQG8KtvtuBbB-EUHVldBTjb_0P0djddTB6Sx5f72WT8mBjGWZsAlIJaIXLgwkoiWUZ1KowtiRCypGYJNmMlKQ2QXOr4GDeMaiup1MtcaDZE17u9W998dBBatXHBQFXpGqI2JYqoNhW0iOTVvySLdxGS9ODlH3DddL6OKpSkacpznvYQ2UHGNyF4sGrr3Ub7L0WJ6n1R0RfV-6L2vsSRi92IA4BfPCtSVuQp-wY13Ikk</recordid><startdate>20081201</startdate><enddate>20081201</enddate><creator>Palko, J.W.</creator><creator>Srour, J.R.</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7QF</scope><scope>7QL</scope><scope>7QQ</scope><scope>7SC</scope><scope>7SE</scope><scope>7SP</scope><scope>7SR</scope><scope>7T7</scope><scope>7TA</scope><scope>7TB</scope><scope>7U5</scope><scope>7U9</scope><scope>8BQ</scope><scope>8FD</scope><scope>C1K</scope><scope>F28</scope><scope>FR3</scope><scope>H8D</scope><scope>H94</scope><scope>JG9</scope><scope>JQ2</scope><scope>KR7</scope><scope>L7M</scope><scope>L~C</scope><scope>L~D</scope><scope>M7N</scope><scope>P64</scope></search><sort><creationdate>20081201</creationdate><title>Amorphous Inclusions in Irradiated Silicon and Their Effects on Material and Device Properties</title><author>Palko, J.W. ; Srour, J.R.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c353t-eed81f886e58f909341a28cfd0889d1cbef43d0dce069a69a35c31af919ab68a3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2008</creationdate><topic>Amorphous materials</topic><topic>Atomic layer deposition</topic><topic>Atomic measurements</topic><topic>Crystalline materials</topic><topic>Damage</topic><topic>Defect clusters</topic><topic>Devices</topic><topic>displacement damage</topic><topic>Dominance</topic><topic>Electronic properties</topic><topic>Energy loss</topic><topic>Inclusions</topic><topic>Irradiation</topic><topic>molecular dynamics</topic><topic>Production</topic><topic>Protons</topic><topic>Radiation effects</topic><topic>Silicon</topic><topic>Thermal degradation</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Palko, J.W.</creatorcontrib><creatorcontrib>Srour, J.R.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Xplore</collection><collection>CrossRef</collection><collection>Aluminium Industry Abstracts</collection><collection>Bacteriology Abstracts (Microbiology B)</collection><collection>Ceramic Abstracts</collection><collection>Computer and Information Systems Abstracts</collection><collection>Corrosion Abstracts</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Industrial and Applied Microbiology Abstracts (Microbiology A)</collection><collection>Materials Business File</collection><collection>Mechanical & Transportation Engineering Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Virology and AIDS Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Environmental Sciences and Pollution Management</collection><collection>ANTE: Abstracts in New Technology & Engineering</collection><collection>Engineering Research Database</collection><collection>Aerospace Database</collection><collection>AIDS and Cancer Research Abstracts</collection><collection>Materials Research Database</collection><collection>ProQuest Computer Science Collection</collection><collection>Civil Engineering Abstracts</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Computer and Information Systems Abstracts – Academic</collection><collection>Computer and Information Systems Abstracts Professional</collection><collection>Algology Mycology and Protozoology Abstracts (Microbiology C)</collection><collection>Biotechnology and BioEngineering Abstracts</collection><jtitle>IEEE transactions on nuclear science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Palko, J.W.</au><au>Srour, J.R.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Amorphous Inclusions in Irradiated Silicon and Their Effects on Material and Device Properties</atitle><jtitle>IEEE transactions on nuclear science</jtitle><stitle>TNS</stitle><date>2008-12-01</date><risdate>2008</risdate><volume>55</volume><issue>6</issue><spage>2992</spage><epage>2999</epage><pages>2992-2999</pages><issn>0018-9499</issn><eissn>1558-1578</eissn><coden>IETNAE</coden><abstract>Clustered damage plays an important role in determining the electronic properties of silicon irradiated with particles having a relatively high rate of nonionizing energy loss. This damage has generally been treated as being heavily defected crystal, but substantial evidence points to amorphization. The structure of radiation-produced amorphous regions in silicon is modeled here using atomistic techniques. Those regions consist of a phase distinct from the surrounding crystal, and models based on amorphous inclusions can explain the dominance of clusters in determining key electronic properties in irradiated bulk material and devices.</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/TNS.2008.2006751</doi><tpages>8</tpages></addata></record> |
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source | IEEE Electronic Library (IEL) Journals |
subjects | Amorphous materials Atomic layer deposition Atomic measurements Crystalline materials Damage Defect clusters Devices displacement damage Dominance Electronic properties Energy loss Inclusions Irradiation molecular dynamics Production Protons Radiation effects Silicon Thermal degradation |
title | Amorphous Inclusions in Irradiated Silicon and Their Effects on Material and Device Properties |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-04T17%3A07%3A54IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_ieee_&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Amorphous%20Inclusions%20in%20Irradiated%20Silicon%20and%20Their%20Effects%20on%20Material%20and%20Device%20Properties&rft.jtitle=IEEE%20transactions%20on%20nuclear%20science&rft.au=Palko,%20J.W.&rft.date=2008-12-01&rft.volume=55&rft.issue=6&rft.spage=2992&rft.epage=2999&rft.pages=2992-2999&rft.issn=0018-9499&rft.eissn=1558-1578&rft.coden=IETNAE&rft_id=info:doi/10.1109/TNS.2008.2006751&rft_dat=%3Cproquest_ieee_%3E2545018831%3C/proquest_ieee_%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c353t-eed81f886e58f909341a28cfd0889d1cbef43d0dce069a69a35c31af919ab68a3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=912256527&rft_id=info:pmid/&rft_ieee_id=4723762&rfr_iscdi=true |