SONOS-Type Flash Memory Cell With Metal[Formula Omitted] Structure for Low-Voltage High-Speed Program/Erase Operation

High-quality Al@@d2@O@@d3@ and Si@@d3@N@@d4@ dielectrics synthesized in a molecular/atomic deposition system were developed and adopted as blocking oxide and tunnel dielectric, respectively in a SONOS-type NAND flash memory cell. In particular, the use of trap-free Si@@d3@N@@d4@ as tunnel dielectric...

Full description

Saved in:
Bibliographic Details
Published in:IEEE electron device letters 2008-05, Vol.29 (5), p.512-514
Main Authors: Shim, Sun Il, Yeh, F.C, Wang, X.W, Ma, T.P
Format: Article
Language:English
Subjects:
Aluminum oxide
Deposition
Dielectrics
Flash memory (computers)
High speed
Oxides
Silicon nitride
Tunnels (transportation)
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:High-quality Al@@d2@O@@d3@ and Si@@d3@N@@d4@ dielectrics synthesized in a molecular/atomic deposition system were developed and adopted as blocking oxide and tunnel dielectric, respectively in a SONOS-type NAND flash memory cell. In particular, the use of trap-free Si@@d3@N@@d4@ as tunnel dielectric enables low- voltage erase operation due to its low barrier height for holes, and the relatively high-k value of Al@@d2@O@@d3@ enhances the low-voltage and high-speed program/erase (P/E) operations. We fabricated and investigated NAND flash memory cells with metal/Al@@d2@O@@d3@/SiN/Si@@d3@N@@d4@/Si structure. The fabricated cell shows 3.8-V memory window with P/E conditions of +15 V for 100 mus and -10 V for 10 ms. It also shows good endurance up to 10 000 cycles and more than 1.5-V memory window after ten years.
ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2008.920979