Color filters including infrared cut-off integrated on CMOS image sensor

A color image was taken with a CMOS image sensor without any infrared cut-off filter, using red, green and blue metal/dielectric filters arranged in Bayer pattern with 1.75 µm pixel pitch. The three colors were obtained by a thickness variation of only two layers in the 7-layer stack, with a technol...

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Bibliographic Details
Published in:Optics express 2011-07, Vol.19 (14), p.13073-13080
Main Authors: Frey, Laurent, Parrein, Pascale, Raby, Jacques, Pellé, Catherine, Hérault, Didier, Marty, Michel, Michailos, Jean
Format: Article
Language:English
Subjects:
Color
Colorimetry - instrumentation
Equipment Design
Equipment Failure Analysis
Filtration - instrumentation
Infrared Rays
Light
Semiconductors
Signal Processing, Computer-Assisted - instrumentation
Systems Integration
Transducers
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Summary:A color image was taken with a CMOS image sensor without any infrared cut-off filter, using red, green and blue metal/dielectric filters arranged in Bayer pattern with 1.75 µm pixel pitch. The three colors were obtained by a thickness variation of only two layers in the 7-layer stack, with a technological process including four photolithography levels. The thickness of the filter stack was only half of the traditional color resists, potentially enabling a reduction of optical crosstalk for smaller pixels. Both color errors and signal to noise ratio derived from optimized spectral responses are expected to be similar to color resists associated with infrared filter.
ISSN:1094-4087
1094-4087
DOI:10.1364/OE.19.013073