Fabrication of waveguide devices by UV photopatterning of fluorinated poly(arylene ether ketone)s containing tetrafluorostyrol moieties

This work demonstrates waveguide devices based on a novel photocrosslinkable fluorinated poly(arylene ether ketone). A new molecular design has enabled waveguide fabrication to be achieved for the first time using this kind of polymer, through direct UV patterning and a wet-etch process, which is fa...

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Bibliographic Details
Published in:Optical Engineering 2007-07, Vol.46 (7), p.074601-074607
Main Authors: Jiang, Jia, Callender, Claire L, Noad, Julian P, Qi, Yinghua, Ding, Jianfu, Day, Michael
Format: Article
Language:English
Subjects:
Devices
directional coupler
Economics
Ethers
fluorinated poly(arylene ether ketone)
Fluorination
Ketones
Patterning
photopatterning
waveguide
Waveguides
wet etching
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Summary:This work demonstrates waveguide devices based on a novel photocrosslinkable fluorinated poly(arylene ether ketone). A new molecular design has enabled waveguide fabrication to be achieved for the first time using this kind of polymer, through direct UV patterning and a wet-etch process, which is faster and more convenient and economical than the process based on standard reactive-ion etching that has been applied to previously reported poly(arylene ether ketone) materials. High-quality waveguides with smooth, well-defined sidewalls have been produced, and optical splitter devices based on directional coupling are demonstrated. Optical characterization of these devices suggests that the waveguide quality is comparable to that of waveguides fabricated using a dry-etch process, and the experimental data obtained from the fabricated optical splitters are in excellent agreement with theoretical predictions.
ISSN:0091-3286
1560-2303
DOI:10.1117/1.2756099