Electrodeposition of antimony telluride thin films from acidic nitrate-tartrate baths

• Published in: Electrochimica acta 2011-06, Vol.56 (16), p.5611-5615
• Main Authors: Jung, Hyunsung, Myung, Nosang V.
• Format: Article
• Language: English
• Subjects: Agitation; Antimony; Antimony telluride; Chemistry; Crystal structure; Deposition; Electrochemical quartz crystal microbalance; Electrochemistry; Electrodeposition; Electrodes; Exact sciences and technology; General and physical chemistry; Microorganisms; Rotating disk electrode; Study of interfaces; Thermoelectrics; Thin films; Under-potential deposition
• ISSN: 0013-4686; 1873-3859
• DOI: 10.1016/j.electacta.2011.04.010

Sb x Te 1− x thin films were electrodeposited from acidic nitrate baths where the film composition and crystal structure were tailored by controlling electrolytic composition, deposition rate, and applied potential. Various electroanaltyical techniques were also utilized to understand the deposition mechanism. Electrochemical quartz crystal microbalance (EQCM) and rotating disk electrode (RDE) techniques were utilized to systematically investigate the electrodeposition of Sb x Te 1− x (0.1 < x < 0.8). In addition, the effect of applied potential and agitation were correlated to the film composition, crystal structure, and morphology. Although the film composition was independent of the agitation rate, the deposition rate, current efficiency, crystallinity and phase of Sb x Te 1− x were all strongly influenced by it. The deposition rate monotonically increased with increases in the rotation rate because of the faster diffusion rate of HTeO 2 + ions to the cathode. Amorphous thin films were electrodeposited in the absence of agitation, whereas polycrystalline Sb 2Te 3 with elemental Sb and Te were co-deposited at a higher agitation independent of the applied deposition potential.