Fabrication of Transmission Color Filters Using Silicon Subwavelength Gratings on Quartz Substrates

We investigate theoretically and experimentally transmission color filters using silicon subwavelength gratings on quartz substrates. Each grating area is 120 mum-square, which is suitable pixel size for displays and multichannel detectors. In the fabrication, electron beam lithography and fast atom...

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Bibliographic Details
Published in:IEEE photonics technology letters 2006-10, Vol.18 (20), p.2126-2128
Main Authors: Kanamori, Y., Shimono, M., Hane, K.
Format: Article
Language:English
Subjects:
Atomic beams
Beams (radiation)
Color
Detectors
Diffraction gratings
Displays
Electron beam lithography
Electron beams
Etching
Fabrication
Filters
Gratings
Gratings (spectra)
Lithography
Micromachining
optical device fabrication
optical filters
optical gratings
Perception
periodic structures
Quartz
Silicon
Silicon substrates
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Summary:We investigate theoretically and experimentally transmission color filters using silicon subwavelength gratings on quartz substrates. Each grating area is 120 mum-square, which is suitable pixel size for displays and multichannel detectors. In the fabrication, electron beam lithography and fast atom beam etching are used. The grating periods are 400, 350, and 440 nm for the red, green, and blue filters, respectively. The transmission spectrum obtained from a coupling between an incident light and the submicrometer periodic grating matches with human color perception. The transmittances of 71.1%, 58.1%, and 59.3% are obtained for the red, green, and blue filters, respectively
ISSN:1041-1135
1941-0174
DOI:10.1109/LPT.2006.883208