Crack propagation and residual stress in laminated Si3N4/BN composite structures

The level of residual stress and crack propagation in a new generation of laminates, based on Si3N4 layers and a mixture of BN and Al2O3 interlayers, is presented. The structure consists of alternated concentric rings of Si3N4 separated by the weak BN interlayer possessing no planes of easy crack pr...

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Bibliographic Details
Published in:Journal of the European Ceramic Society 2011-08, Vol.31 (9), p.1841-1847
Main Authors: Krstic, Z, Krstic, V D
Format: Article
Language:English
Subjects:
Aluminum oxide
Boron nitride
Crack propagation
Fracture mechanics
Interlayers
Laminates
Residual stress
Silicon nitride
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Summary:The level of residual stress and crack propagation in a new generation of laminates, based on Si3N4 layers and a mixture of BN and Al2O3 interlayers, is presented. The structure consists of alternated concentric rings of Si3N4 separated by the weak BN interlayer possessing no planes of easy crack propagation and fracture resistance much larger than those of any classical planar laminates. Results on direction of crack propagation and residual stress in relation to inter-layer composition, the number of layers, and their thickness were investigated. The effect of residual stress on crack propagation was studied using Vickers indentation. The highest compressive residual stress of about 170 MPa was found in samples with five layers possessing an average layer thickness of about 310 x 10(-6) m.
ISSN:0955-2219
DOI:10.1016/j.jeurceramsoc.2011.03.009