Optimized surface silylation of chemically amplified epoxidized photoresists for micromachining applications

We explored the selective wet silylation of noncrosslinked areas of epoxidized photoresists using chlorosilanes. Emphasis was placed on the Si uptake of the epoxy films when controlled low levels of water were incorporated into the silylation solution. Fourier transform infrared measurements and oxy...

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Published in:Journal of applied polymer science 2010-08, Vol.117 (4), p.2189-2195
Main Authors: Kontziampasis, D, Beltsios, K, Tegou, E, Argitis, P, Gogolides, E
Format: Article
Language:English
Subjects:
Applied sciences
Chlorosilanes
Electronics
Exact sciences and technology
Fourier transforms
functionalization of polymers
Infrared
Low level
Microelectronic fabrication (materials and surfaces technology)
Micromachining
microstructure
Photoresists
selectivity
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Tuning
Uptakes
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cited_by cdi_FETCH-LOGICAL-c4264-54aae79050852939e60d9828464776425f4d4495b4963fb4adb943e620e1dda93
cites cdi_FETCH-LOGICAL-c4264-54aae79050852939e60d9828464776425f4d4495b4963fb4adb943e620e1dda93
container_end_page 2195
container_issue 4
container_start_page 2189
container_title Journal of applied polymer science
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creator Kontziampasis, D
Beltsios, K
Tegou, E
Argitis, P
Gogolides, E
description We explored the selective wet silylation of noncrosslinked areas of epoxidized photoresists using chlorosilanes. Emphasis was placed on the Si uptake of the epoxy films when controlled low levels of water were incorporated into the silylation solution. Fourier transform infrared measurements and oxygen-plasma resistance data with in situ laser interferometry and multiwavelength ellipsometry are presented. The fine tuning of the moisture level was found to be crucial for the generation of satisfactory and reproducible structures. The optimized version of the process was shown to be useful for epoxy-based dry micromachining. Overall, an attractive positive-tone process is presented as an alternative to the usual negative-tone process for commercial epoxy resists.
doi_str_mv 10.1002/app.31644
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1097-4628
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subjects Applied sciences
Chlorosilanes
Electronics
Exact sciences and technology
Fourier transforms
functionalization of polymers
Infrared
Low level
Microelectronic fabrication (materials and surfaces technology)
Micromachining
microstructure
Photoresists
selectivity
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Tuning
Uptakes
title Optimized surface silylation of chemically amplified epoxidized photoresists for micromachining applications
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