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Fluorographene: A Two-Dimensional Counterpart of Teflon
A stoichiometric derivative of graphene with a fluorine atom attached to each carbon is reported. Raman, optical, structural, micromechanical, and transport studies show that the material is qualitatively different from the known graphene‐based nonstoichiometric derivatives. Fluorographene is a high...
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Published in: | Small (Weinheim an der Bergstrasse, Germany) Germany), 2010-12, Vol.6 (24), p.2877-2884 |
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creator | Nair, Rahul R. Ren, Wencai Jalil, Rashid Riaz, Ibtsam Kravets, Vasyl G. Britnell, Liam Blake, Peter Schedin, Fredrik Mayorov, Alexander S. Yuan, Shengjun Katsnelson, Mikhail I. Cheng, Hui-Ming Strupinski, Wlodek Bulusheva, Lyubov G. Okotrub, Alexander V. Grigorieva, Irina V. Grigorenko, Alexander N. Novoselov, Kostya S. Geim, Andre K. |
description | A stoichiometric derivative of graphene with a fluorine atom attached to each carbon is reported. Raman, optical, structural, micromechanical, and transport studies show that the material is qualitatively different from the known graphene‐based nonstoichiometric derivatives. Fluorographene is a high‐quality insulator (resistivity >1012 Ω) with an optical gap of 3 eV. It inherits the mechanical strength of graphene, exhibiting a Young’s modulus of 100 N m−1 and sustaining strains of 15%. Fluorographene is inert and stable up to 400 °C even in air, similar to Teflon.
Fluorination of graphene yields a stoichiometric derivative of graphene with a fluorine atom attached to each carbon. Fluorographene is an optically transparent, high‐quality insulator with a mechanical strength and elasticity, matching those of graphene. It is inert and thermally stable, similar to Teflon. |
doi_str_mv | 10.1002/smll.201001555 |
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Fluorination of graphene yields a stoichiometric derivative of graphene with a fluorine atom attached to each carbon. Fluorographene is an optically transparent, high‐quality insulator with a mechanical strength and elasticity, matching those of graphene. It is inert and thermally stable, similar to Teflon.</description><identifier>ISSN: 1613-6810</identifier><identifier>ISSN: 1613-6829</identifier><identifier>EISSN: 1613-6829</identifier><identifier>DOI: 10.1002/smll.201001555</identifier><identifier>PMID: 21053339</identifier><language>eng</language><publisher>Weinheim: WILEY-VCH Verlag</publisher><subject>Carbon ; Derivatives ; Electrical resistivity ; fluorination ; fluorographene ; Graphene ; Graphite - chemistry ; Halogenation ; Inert ; Insulators ; Microscopy, Electron, Transmission ; Modulus of elasticity ; Polytetrafluoroethylene - chemistry ; Polytetrafluoroethylenes ; Spectrum Analysis, Raman ; Teflon</subject><ispartof>Small (Weinheim an der Bergstrasse, Germany), 2010-12, Vol.6 (24), p.2877-2884</ispartof><rights>Copyright © 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c4805-8ff2f76d554752aff8272ab8becd9005c55bec46891032e9e5c1c21c219b28cf3</citedby><cites>FETCH-LOGICAL-c4805-8ff2f76d554752aff8272ab8becd9005c55bec46891032e9e5c1c21c219b28cf3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/21053339$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Nair, Rahul R.</creatorcontrib><creatorcontrib>Ren, Wencai</creatorcontrib><creatorcontrib>Jalil, Rashid</creatorcontrib><creatorcontrib>Riaz, Ibtsam</creatorcontrib><creatorcontrib>Kravets, Vasyl G.</creatorcontrib><creatorcontrib>Britnell, Liam</creatorcontrib><creatorcontrib>Blake, Peter</creatorcontrib><creatorcontrib>Schedin, Fredrik</creatorcontrib><creatorcontrib>Mayorov, Alexander S.</creatorcontrib><creatorcontrib>Yuan, Shengjun</creatorcontrib><creatorcontrib>Katsnelson, Mikhail I.</creatorcontrib><creatorcontrib>Cheng, Hui-Ming</creatorcontrib><creatorcontrib>Strupinski, Wlodek</creatorcontrib><creatorcontrib>Bulusheva, Lyubov G.</creatorcontrib><creatorcontrib>Okotrub, Alexander V.</creatorcontrib><creatorcontrib>Grigorieva, Irina V.</creatorcontrib><creatorcontrib>Grigorenko, Alexander N.</creatorcontrib><creatorcontrib>Novoselov, Kostya S.</creatorcontrib><creatorcontrib>Geim, Andre K.</creatorcontrib><title>Fluorographene: A Two-Dimensional Counterpart of Teflon</title><title>Small (Weinheim an der Bergstrasse, Germany)</title><addtitle>Small</addtitle><description>A stoichiometric derivative of graphene with a fluorine atom attached to each carbon is reported. Raman, optical, structural, micromechanical, and transport studies show that the material is qualitatively different from the known graphene‐based nonstoichiometric derivatives. Fluorographene is a high‐quality insulator (resistivity >1012 Ω) with an optical gap of 3 eV. It inherits the mechanical strength of graphene, exhibiting a Young’s modulus of 100 N m−1 and sustaining strains of 15%. Fluorographene is inert and stable up to 400 °C even in air, similar to Teflon.
Fluorination of graphene yields a stoichiometric derivative of graphene with a fluorine atom attached to each carbon. Fluorographene is an optically transparent, high‐quality insulator with a mechanical strength and elasticity, matching those of graphene. It is inert and thermally stable, similar to Teflon.</description><subject>Carbon</subject><subject>Derivatives</subject><subject>Electrical resistivity</subject><subject>fluorination</subject><subject>fluorographene</subject><subject>Graphene</subject><subject>Graphite - chemistry</subject><subject>Halogenation</subject><subject>Inert</subject><subject>Insulators</subject><subject>Microscopy, Electron, Transmission</subject><subject>Modulus of elasticity</subject><subject>Polytetrafluoroethylene - chemistry</subject><subject>Polytetrafluoroethylenes</subject><subject>Spectrum Analysis, Raman</subject><subject>Teflon</subject><issn>1613-6810</issn><issn>1613-6829</issn><issn>1613-6829</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNqFkM9PwjAYhhujEUWvHs1unob9sW6tNwRB49AYMXprutHqtFtny4L8946AxBvJl3zv4XnfwwPAGYI9BCG-9KUxPQzbjCile-AIxYiEMcN8f5sR7IBj7z8hJAhHySHoYAQpIYQfgWRkGuvsu5P1h6rUVdAPpgsbDotSVb6wlTTBwDbVXLlaunlgdTBV2tjqBBxoabw63fwueBndTAe3Yfo4vhv00zCPGKQh0xrrJJ5RGiUUS60ZTrDMWKbyGYeQ5pS2MYoZR5BgxRXNUY5XxzPMck264GK9Wzv73Sg_F2Xhc2WMrJRtvOAQxYywiO8kGWIRxC3Ykr01mTvrvVNa1K4opVsKBMXKqlhZFVurbeF8M91kpZpt8T-NLcDXwKIwarljTjxP0vT_eLjuFn6ufrZd6b5EnJCEiteHsRhPxm_D--tYPJFfz6-R3A</recordid><startdate>20101220</startdate><enddate>20101220</enddate><creator>Nair, Rahul R.</creator><creator>Ren, Wencai</creator><creator>Jalil, Rashid</creator><creator>Riaz, Ibtsam</creator><creator>Kravets, Vasyl G.</creator><creator>Britnell, Liam</creator><creator>Blake, Peter</creator><creator>Schedin, Fredrik</creator><creator>Mayorov, Alexander S.</creator><creator>Yuan, Shengjun</creator><creator>Katsnelson, Mikhail I.</creator><creator>Cheng, Hui-Ming</creator><creator>Strupinski, Wlodek</creator><creator>Bulusheva, Lyubov G.</creator><creator>Okotrub, Alexander V.</creator><creator>Grigorieva, Irina V.</creator><creator>Grigorenko, Alexander N.</creator><creator>Novoselov, Kostya S.</creator><creator>Geim, Andre K.</creator><general>WILEY-VCH Verlag</general><general>WILEY‐VCH Verlag</general><scope>BSCLL</scope><scope>CGR</scope><scope>CUY</scope><scope>CVF</scope><scope>ECM</scope><scope>EIF</scope><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>F28</scope><scope>FR3</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20101220</creationdate><title>Fluorographene: A Two-Dimensional Counterpart of Teflon</title><author>Nair, Rahul R. ; Ren, Wencai ; Jalil, Rashid ; Riaz, Ibtsam ; Kravets, Vasyl G. ; Britnell, Liam ; Blake, Peter ; Schedin, Fredrik ; Mayorov, Alexander S. ; Yuan, Shengjun ; Katsnelson, Mikhail I. ; Cheng, Hui-Ming ; Strupinski, Wlodek ; Bulusheva, Lyubov G. ; Okotrub, Alexander V. ; Grigorieva, Irina V. ; Grigorenko, Alexander N. ; Novoselov, Kostya S. ; Geim, Andre K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c4805-8ff2f76d554752aff8272ab8becd9005c55bec46891032e9e5c1c21c219b28cf3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Carbon</topic><topic>Derivatives</topic><topic>Electrical resistivity</topic><topic>fluorination</topic><topic>fluorographene</topic><topic>Graphene</topic><topic>Graphite - chemistry</topic><topic>Halogenation</topic><topic>Inert</topic><topic>Insulators</topic><topic>Microscopy, Electron, Transmission</topic><topic>Modulus of elasticity</topic><topic>Polytetrafluoroethylene - chemistry</topic><topic>Polytetrafluoroethylenes</topic><topic>Spectrum Analysis, Raman</topic><topic>Teflon</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Nair, Rahul R.</creatorcontrib><creatorcontrib>Ren, Wencai</creatorcontrib><creatorcontrib>Jalil, Rashid</creatorcontrib><creatorcontrib>Riaz, Ibtsam</creatorcontrib><creatorcontrib>Kravets, Vasyl G.</creatorcontrib><creatorcontrib>Britnell, Liam</creatorcontrib><creatorcontrib>Blake, Peter</creatorcontrib><creatorcontrib>Schedin, Fredrik</creatorcontrib><creatorcontrib>Mayorov, Alexander S.</creatorcontrib><creatorcontrib>Yuan, Shengjun</creatorcontrib><creatorcontrib>Katsnelson, Mikhail I.</creatorcontrib><creatorcontrib>Cheng, Hui-Ming</creatorcontrib><creatorcontrib>Strupinski, Wlodek</creatorcontrib><creatorcontrib>Bulusheva, Lyubov G.</creatorcontrib><creatorcontrib>Okotrub, Alexander V.</creatorcontrib><creatorcontrib>Grigorieva, Irina V.</creatorcontrib><creatorcontrib>Grigorenko, Alexander N.</creatorcontrib><creatorcontrib>Novoselov, Kostya S.</creatorcontrib><creatorcontrib>Geim, Andre K.</creatorcontrib><collection>Istex</collection><collection>Medline</collection><collection>MEDLINE</collection><collection>MEDLINE (Ovid)</collection><collection>MEDLINE</collection><collection>MEDLINE</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>ANTE: Abstracts in New Technology & Engineering</collection><collection>Engineering Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Small (Weinheim an der Bergstrasse, Germany)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Nair, Rahul R.</au><au>Ren, Wencai</au><au>Jalil, Rashid</au><au>Riaz, Ibtsam</au><au>Kravets, Vasyl G.</au><au>Britnell, Liam</au><au>Blake, Peter</au><au>Schedin, Fredrik</au><au>Mayorov, Alexander S.</au><au>Yuan, Shengjun</au><au>Katsnelson, Mikhail I.</au><au>Cheng, Hui-Ming</au><au>Strupinski, Wlodek</au><au>Bulusheva, Lyubov G.</au><au>Okotrub, Alexander V.</au><au>Grigorieva, Irina V.</au><au>Grigorenko, Alexander N.</au><au>Novoselov, Kostya S.</au><au>Geim, Andre K.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Fluorographene: A Two-Dimensional Counterpart of Teflon</atitle><jtitle>Small (Weinheim an der Bergstrasse, Germany)</jtitle><addtitle>Small</addtitle><date>2010-12-20</date><risdate>2010</risdate><volume>6</volume><issue>24</issue><spage>2877</spage><epage>2884</epage><pages>2877-2884</pages><issn>1613-6810</issn><issn>1613-6829</issn><eissn>1613-6829</eissn><abstract>A stoichiometric derivative of graphene with a fluorine atom attached to each carbon is reported. Raman, optical, structural, micromechanical, and transport studies show that the material is qualitatively different from the known graphene‐based nonstoichiometric derivatives. Fluorographene is a high‐quality insulator (resistivity >1012 Ω) with an optical gap of 3 eV. It inherits the mechanical strength of graphene, exhibiting a Young’s modulus of 100 N m−1 and sustaining strains of 15%. Fluorographene is inert and stable up to 400 °C even in air, similar to Teflon.
Fluorination of graphene yields a stoichiometric derivative of graphene with a fluorine atom attached to each carbon. Fluorographene is an optically transparent, high‐quality insulator with a mechanical strength and elasticity, matching those of graphene. It is inert and thermally stable, similar to Teflon.</abstract><cop>Weinheim</cop><pub>WILEY-VCH Verlag</pub><pmid>21053339</pmid><doi>10.1002/smll.201001555</doi><tpages>8</tpages></addata></record> |
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subjects | Carbon Derivatives Electrical resistivity fluorination fluorographene Graphene Graphite - chemistry Halogenation Inert Insulators Microscopy, Electron, Transmission Modulus of elasticity Polytetrafluoroethylene - chemistry Polytetrafluoroethylenes Spectrum Analysis, Raman Teflon |
title | Fluorographene: A Two-Dimensional Counterpart of Teflon |
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