PMMA nanocolumn array fabricated by catalytic etching and nanomolding technique

This study presents a combined self-assembled nano-sphere lithography (SANL) and catalytic etching technique to cost-effectively form an arrayed nano-column on a silicon wafer. The highest aspect ratio of the column fabricated through catalytic etching in this study was approximately 41:1. The elect...

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Bibliographic Details
Published in:Microelectronic engineering 2011-08, Vol.88 (8), p.2576-2579
Main Authors: Huang, Mao-Jung, Yang, Chii-Rong, Chang, Chun-Ming, Lin, Chun-Ting, Tang, Yu-Hsiang, Shiao, Ming-Hua, Chiou, Yuang-Cherng, Lee, Rong-Tsong
Format: Article
Language:English
Subjects:
Applied sciences
Arrays
Catalysis
Catalysts
Catalytic etching
Cross-disciplinary physics: materials science
rheology
Electronics
Etching
Exact sciences and technology
Materials science
Methods of nanofabrication
Microelectronic fabrication (materials and surfaces technology)
Nano-column
Nano-molding
Nanocomposites
Nanolithography
Nanomaterials
Nanoscale pattern formation
Nanostructure
Physics
Polymethyl methacrylates
SANL
Self-assembly
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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Summary:This study presents a combined self-assembled nano-sphere lithography (SANL) and catalytic etching technique to cost-effectively form an arrayed nano-column on a silicon wafer. The highest aspect ratio of the column fabricated through catalytic etching in this study was approximately 41:1. The electroforming method can convert a silicon nano-column array to a nano-pore array in a metallic stamp. Finally, a hot embossing process was used to mold nano-column arrays on polymethyl methacrylate (PMMA) substrate. The resulting structured PMMA surface exhibited a contact angle of 99.8°.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2011.02.028