Plasma Grooving System Using Atmospheric Pressure Surface Discharge Plasma

To fabricate narrow front contact grooves on a single crystalline silicon solar cell, we carried out etching of a silicon nitride film on a silicon substrate using the surface discharge plasma operated at atmospheric pressure. The control of groove width by changing the discharge voltage ( V d ) and...

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Bibliographic Details
Published in:Plasma chemistry and plasma processing 2009-06, Vol.29 (3), p.197-204
Main Authors: Hamada, Toshiyuki, Sakoda, Tatsuya, Otsubo, Masahisa
Format: Article
Language:English
Subjects:
Atmospheric pressure
Barometric pressure
Characterization and Evaluation of Materials
Chemistry
Chemistry and Materials Science
Classical Mechanics
Discharge
Electric potential
Electrodes
Grooves
Grooving
Inorganic Chemistry
Mechanical Engineering
Original Paper
Silicon substrates
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Summary:To fabricate narrow front contact grooves on a single crystalline silicon solar cell, we carried out etching of a silicon nitride film on a silicon substrate using the surface discharge plasma operated at atmospheric pressure. The control of groove width by changing the discharge voltage ( V d ) and the length of a back electrode ( l ) used for formation of the surface discharge was examined. It was found that narrower electrode grooves could be obtained when l was short. For the case of l  = 2 mm, the narrowest groove of 116 μm was obtained at V d  = 3.5 kV and the processing time ( t e ) of 10 s.
ISSN:0272-4324
1572-8986
DOI:10.1007/s11090-009-9170-6