Sacrificial layers for air gaps in NEMS using alucone molecular layer deposition

A molecular layer deposition approach is reported that produces a new class of hybrid organic-inorganic thin films. These films have very low densities, and display typical atomic layer deposition characteristics: controllable linear growth, conformality, low roughness, and uniform composition. Beca...

Full description

Saved in:
Bibliographic Details
Published in:Sensors and actuators. A. Physical. 2009-10, Vol.155 (1), p.8-15
Main Authors: Seghete, D., Davidson, B.D., Hall, R.A., Chang, Y.J., Bright, V.M., George, S.M.
Format: Article
Language:English
Subjects:
Air gaps
Density
Deposition
Etching
Molecular structure
Nanoelectromechanical systems
Nanostructure
Roughness
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:A molecular layer deposition approach is reported that produces a new class of hybrid organic-inorganic thin films. These films have very low densities, and display typical atomic layer deposition characteristics: controllable linear growth, conformality, low roughness, and uniform composition. Because of their aluminum content, the alucone films cannot be dry etched with oxygen plasma. In accordance with their molecular structure, the new materials are completely removed in hydrochloric acid solutions. Since they can be etched with accurate control in acidic solutions, these hybrid materials are promising for the fabrication of MEMS/NEMS (Micro/Nano Electro Mechanical Systems) devices. Doubly supported structures with 120 nm air gaps are demonstrated using alucone materials as sacrificial layers.
ISSN:0924-4247
DOI:10.1016/j.sna.2008.12.016