Thin-film deposition of (Ba sub(x)Sr sub(1-x))TiO sub(3) by pulsed ion beam evaporation

An ablation plasma generated by intense, pulsed ion beam was used for thin-film deposition of commercially interesting material (Ba sub(x), Sr sub(1-x))TiO sub(3) (0[Lt]x[Lt]1). The deposition has been carried out in vacuum and on the substrate at the room temperature. The deposited thin films were...

Full description

Saved in:
Bibliographic Details
Published in:IEEE transactions on plasma science 2000-01, Vol.28 (5)
Main Authors: Sonegawa, T, Ohtomo, K, Jiang, Weihua, Yatsui, K
Format: Article
Language:English
Subjects:
Ablation
Deposition
Dielectric constant
Evaporation
Ion beams
Shot
Thin films
X-rays
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:An ablation plasma generated by intense, pulsed ion beam was used for thin-film deposition of commercially interesting material (Ba sub(x), Sr sub(1-x))TiO sub(3) (0[Lt]x[Lt]1). The deposition has been carried out in vacuum and on the substrate at the room temperature. The deposited thin films were analyzed by using Rutherford backward scattering, X-ray photoelectron spectroscopy, atomic force microscope and scanning electron microscopy. It has been understood that the film deposition rate was ~20 nm/shot and the thin film had the same composition as the target. Maximum dielectric constant was obtained at x=0.5
ISSN:0093-3813
DOI:10.1109/27.901230