Time-Modulated CVD Process Optimized Using the Taguchi Method

The Taguchi method is used herein to optimize the time-modulated chemical vapor deposition (TMCVD) process. TMCVD can be used to deposit smooth, nanocrystalline diamond (NCD) coatings onto a range of substrate materials. The implementation of the Taguchi method to optimize the TMCVD process can save...

Full description

Saved in:
Bibliographic Details
Published in:Journal of materials engineering and performance 2006-04, Vol.15 (2), p.236-241
Main Authors: Ahmed, W, Ahmed, E, Maryan, C, Jackson, M J, Ogwu, A A, Ali, N, Neto, V F, Gracio, J
Format: Article
Language:English
Subjects:
Chemical vapor deposition
Hardness
Materials engineering
Microstructure
Nanocrystals
Surface roughness
Taguchi methods
Vickers hardness
Citations: Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The Taguchi method is used herein to optimize the time-modulated chemical vapor deposition (TMCVD) process. TMCVD can be used to deposit smooth, nanocrystalline diamond (NCD) coatings onto a range of substrate materials. The implementation of the Taguchi method to optimize the TMCVD process can save time, effort, and money. The Taguchi method significantly reduces the number of experiments required to optimize a fabrication process. In this study, the effect of five TMCVD process parameters is investigated with respect to five key factors of the as-grown samples. Each parameter was varied at four different values (experimental levels). The five key factors, taking into consideration the experimental levels, were optimized after performing only 16 experiments. The as-grown films were characterized for hardness, quality, surface roughness, and microstructure using scanning electron microscopy, Raman spectroscopy, surface profilometry, and Vickers hardness testing.
ISSN:1059-9495
1544-1024
DOI:10.1361/105994906X95940