Structural characterization of supported nanocrystalline ZnO thin films prepared by dip-coating

• Published in: Applied surface science 2011-09, Vol.257 (23), p.10045-10051
• Main Authors: Casanova, J.R., Heredia, E.A., Bojorge, C.D., Cánepa, H.R., Kellermann, G., Craievich, A.F.
• Format: Article
• Language: English
• Subjects: Annealing; Atomic force microscopy; Condensed matter: electronic structure, electrical, magnetic, and optical properties; Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Density; Dip coatings; Exact sciences and technology; GISAXS; Nanocrystals; Nanostructure; Nanostructured thin films; Physics; Thin films; Zinc oxide; ZnO
• ISSN: 0169-4332; 1873-5584
• DOI: 10.1016/j.apsusc.2011.06.136

► Different thermal treatments were studied onto ZnO thin films obtained by sol–gel. ► A most efficient compaction occurs at the highest annealing temperature. ► Roughness and thickness of thin films were compared by different techniques. ► Internal nanoporous structure of ZnO thin films was characterized by GISAXS. ► General results kept consistency for each sample as well as for total set. ► Nanocrystalline ZnO thin films prepared by the sol–gel dip-coating technique were characterized by grazing incidence X-ray diffraction (GIXD), atomic force microscopy (AFM), X-ray reflectivity (XR) and grazing incidence small-angle X-ray scattering (GISAXS). The structures of several thin films subjected to (i) isochronous annealing at 350, 450 and 550°C, and (ii) isothermal annealing at 450°C during different time periods, were characterized. The studied thin films are composed of ZnO nanocrystals as revealed by analysing several GIXD patterns, from which their average sizes were determined. Thin film thickness and roughness were determined from quantitative analyses of AFM images and XR patterns. The analysis of XR patterns also yielded the average density of the studied films. Our GISAXS study indicates that the studied ZnO thin films contain nanopores with an ellipsoidal shape, and flattened along the direction normal to the substrate surface. The thin film annealed at the highest temperature, T=550°C, exhibits higher density and lower thickness and nanoporosity volume fraction, than those annealed at 350 and 450°C. These results indicate that thermal annealing at the highest temperature (550°C) induces a noticeable compaction effect on the structure of the studied thin films.