Deposition of TiN/CrN hard superlattices by reactive d.c. magnetron sputtering

Multilayer superlattice coatings of TiN/CrN were deposited on silicon substrates using a reactive d.c. magnetron sputtering process. Superlattice period, also known as modulation wavelength (A), was controlled by controlling the dwell time of the substrate underneath Ti and Cr targets. X-ray diffrac...

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Bibliographic Details
Published in:Bulletin of materials science 2003-02, Vol.26 (2), p.233-237
Main Authors: Barshilia, Harish C., Rajam, K. S.
Format: Article
Language:English
Subjects:
Chromium nitride
Coatings
Deposition
Dwell time
Hardness
Ion bombardment
Magnetron sputtering
Modulation
Multilayers
Nanoindentation
Partial pressure
Process parameters
Reflection
Silicon substrates
Superlattices
Thin films
Titanium nitride
X-ray diffraction
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Summary:Multilayer superlattice coatings of TiN/CrN were deposited on silicon substrates using a reactive d.c. magnetron sputtering process. Superlattice period, also known as modulation wavelength (A), was controlled by controlling the dwell time of the substrate underneath Ti and Cr targets. X-ray diffraction (XRD), nanoindentation and atomic force microscopy (AFM) were used to characterize the films. The XRD data showed 1st and 2nd order satellite reflections along the principal reflection for films having 132 Å > Å > 84 Å, thus confirming the formation of superlattice. The multilayer coatings exhibited hardness(H) as high as 3200 kg/mm2, which is 2 times the rule-of-mixtures value (i.e.)HTiN= 2200 kg/mm2 andHCrN= 1000 kg/mm2). Detailed investigations on the effects of various process parameters indicated that hardness of the superlattice coatings was affected not only by modulation wavelength but also by nitrogen partial pressure and ion bombardment during deposition.
ISSN:0250-4707
0973-7669
DOI:10.1007/BF02707797