Designing of high-resolution photoresists: use of modern NMR techniques for evaluating lithographic performance

Applications of improved 1-D/ 2-D NMR spectroscopic techniques have been reviewed for quantitatively estimating the incorporation of different monomers and degree of linearity in resin microstructure. Comparison of the NMR data with those from lithography leads to a distinct correlation between resi...

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Bibliographic Details
Published in:Bulletin of materials science 2004-06, Vol.27 (3), p.303-316
Main Authors: Roy, Debmalya, Basu, P. K., Raghunathan, P., Eswaran, S. V.
Format: Article
Language:English
Subjects:
Correlation
Crosslinking
Lithography
Microstructure
Monomers
NMR
Nuclear magnetic resonance
Performance evaluation
Photoresists
Polymers
Resins
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Summary:Applications of improved 1-D/ 2-D NMR spectroscopic techniques have been reviewed for quantitatively estimating the incorporation of different monomers and degree of linearity in resin microstructure. Comparison of the NMR data with those from lithography leads to a distinct correlation between resin micro-structure and lithographic performance. A novel photoresist mechanism is proposed in a positive photoresist; also, using modern NMR techniques, the crosslinking mechanism in a negative photoresist has been studied.
ISSN:0250-4707
0973-7669
DOI:10.1007/BF02708521