Characteristics of ZnO thin film deposited on various metal bottom electrodes

ZnO films for electronic applications were deposited by radio-frequency (rf) sputtering onto various metal bottom electrodes (Pt/Ti, W, Ni) to investigate such structural properties as crystallinity and surface morphology. The crystallinity, surface morphology and composition of the as-deposited fil...

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Bibliographic Details
Published in:Metals and materials international 2003-08, Vol.9 (4), p.383-387
Main Authors: Jeon, Young Ah, No, Kwang Soo, Kim, Jong Sung, Yoon, Young Soo
Format: Article
Language:English
Subjects:
Compressive properties
Crystallinity
Deposition
Electrodes
Grain size
Metallurgy
Morphology
Nickel
Platinum
Preferred orientation
Residual stress
Scanning electron microscopy
Silicon dioxide
Texturing
Thin films
Titanium
Zinc oxide
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Summary:ZnO films for electronic applications were deposited by radio-frequency (rf) sputtering onto various metal bottom electrodes (Pt/Ti, W, Ni) to investigate such structural properties as crystallinity and surface morphology. The crystallinity, surface morphology and composition of the as-deposited films were studied using X-ray diffraction (XRD), scanning electron microscopy (SEM) and Rutherford back-scattering spectrometry (RBS), respectively. The preferred orientation and surface morphologies were strongly influenced by the type of bottom electrodes. The ZnO films with (200) texturing deposited on Pt/Ti/SiO2/Si showed a smoother and smaller grain size than those deposited on W and Ni. The ZnO films on Pt and W electrodes exhibited compressive residual stress.
ISSN:1598-9623
2005-4149
DOI:10.1007/BF03027192