Optical studies of (AsSe)100−xSbx thin films

Thin arsenic-selenium-antimony films (AsSe) 100− x Sb x ( x =0,5,10,15 mol.%) have been deposited on glass substrates by vacuum thermal evaporation (VTE) and pulsed laser deposition (PLD) techniques from the corresponding bulk glassy materials. The refractive index and the film thickness have been d...

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Bibliographic Details
Published in:Applied physics. A, Materials science & processing Materials science & processing, 2011-09, Vol.104 (3), p.959-962
Main Authors: Petkova, T., Ilcheva, V., Petkov, E., Petkov, P., Socol, G., Sima, F., Ristoscu, C., Mihailescu, C. N., Mihailescu, I. N., Popov, C., Reithmaier, J. P.
Format: Article
Language:English
Subjects:
Antimony
Approximation
Characterization and Evaluation of Materials
Condensed Matter Physics
Deposition
Glassy
Machines
Manufacturing
Mathematical analysis
Nanotechnology
Optical and Electronic Materials
Physics
Physics and Astronomy
Processes
Refractive index
Refractivity
Surfaces and Interfaces
Thin Films
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Summary:Thin arsenic-selenium-antimony films (AsSe) 100− x Sb x ( x =0,5,10,15 mol.%) have been deposited on glass substrates by vacuum thermal evaporation (VTE) and pulsed laser deposition (PLD) techniques from the corresponding bulk glassy materials. The refractive index and the film thickness have been determined from the optical transmission spectra by modified Swanepoel method. The optical band gap calculated using the Tauc’s approximation showed a narrowing as a function of the increased Sb content from 1.74 eV to 1.53 eV in the VTE films and from 1.64 eV to 1.42 eV in the PLD films. The refractive index of the Sb-doped films strongly increased with the Sb content and reached the largest value for the PLD films. The results verify that both techniques are suitable for deposition of thin glassy films with high optical quality.
ISSN:0947-8396
1432-0630
DOI:10.1007/s00339-011-6461-6