IR spectroscopic determination of the refractive index and thickness of hydrogenated silicon layers

IR spectroscopic techniques widely used to determine the thickness and refractive index of layers and thin films of various materials are adapted for determining those of hydrogenated silicon layers. Based on a literature analysis, three formulas are chosen which enable the refractive index and thic...

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Bibliographic Details
Published in:Inorganic materials 2011-06, Vol.47 (6), p.575-578
Main Authors: Timoshenkov, S. P., Pelipas, V. P., Simonov, B. M., Britkov, O. M., Kalugin, V. V.
Format: Article
Language:English
Subjects:
Chemistry
Chemistry and Materials Science
Industrial Chemistry/Chemical Engineering
Infrared radiation
Infrared spectroscopy
Inorganic Chemistry
Materials Science
Reflection
Refractive index
Refractivity
Silicon
Spectra
Spectroscopy
Thin films
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Summary:IR spectroscopic techniques widely used to determine the thickness and refractive index of layers and thin films of various materials are adapted for determining those of hydrogenated silicon layers. Based on a literature analysis, three formulas are chosen which enable the refractive index and thickness of such layers to be determined from reflection and transmission spectra. The formulas are applicable, with some restrictions, to other samples in the form of relatively transparent layers (films) on transparent substrates. Experimental data are presented that illustrate the use of the formulas.
ISSN:0020-1685
1608-3172
DOI:10.1134/S0020168511060215